Abstract

It is important to predict ion implanted profiles in substrates comprised of different materials, where related moment parameters are different. We describe two procedures to generate profiles in multi-layers by using data for each layer, that is, dose matching method, and R_p normalized method, where R_p is the projected range. We show the process in which the methods are applied to multi-layers. Dose matching method is a simple and effective method. However, it provides unstable results sometimes, while R_p normalized method provides stable results.