Abstract
SHS investigation development is considered from the geographical and historical viewpoint. 3 stages are described. Within Stage 1 the work was carried out in the Department of the Institute of Chemical Physics in Chernogolovka where the scientific discovery had been made. At Stage 2 the interest to SHS arose in different cities and towns of the former USSR. Within Stage 3 SHS entered the international scene. Now SHS processes and products are being studied in more than 50 countries.
Abstract
This chapter discusses the ion implantation process of silicon processing
technology in depth. The chapter gives an in-depth insight into various aspects of the
ion implantation process and ion-implanted silicon systems commonly encountered
in a silicon process. After reading this chapter, the readers will have a sound
understanding of the ion implantation process and its various aspects.
Keywords:
Buried layer, Channeling, Ion implantation, Ion stopping, Range theory, Recoils.
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Authors:Bentham Science Books