Abstract

In this paper, we report a significant improvement of electron field emission property in patterned carbon nanotubes films by using a high temperature (650 °C) hydrogen plasma treatment. This treatment was found to greatly increase the emission current, emission uniformity and stability. The mechanism study showed that these enhanced properties are attributed to the lowering of the potential barrier and the creation of geometrical features through the removal of amorphous carbon, catalyst particles and the saturation of dangling bonds after such a hydrogen plasma treatment.

Keywords: Patterned carbon nanotubes, electron field emission, hydrogen plasma treatment, vacuum microelectronic devices